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Corial 700
Equipment Control & Software
COSMA Software with:
Edit menu for process recipe edition,
Adjust menu for process optimizing,
Maintenance menus for complete equipment control via
internet with VPN (Virtual Private Network).
CORS Software for:
Data reprocessing (Measures and data comparison).
A Tool Organized in
Successive Levels
Server for
GUI
COSMA
Controller
Monitoring
Operator
Lots
Actions
COSMA
Supervisor
Remote GUI
Monitoring
Process
Controller
Embedded
control PU
Monitoring
Device
Controllers
Process
Actions
Embedded
control
function
Closed-loop
Physical
devices
Constructor
PC User
Diagram Modes
Stand-by
Mode
Production
Mode
Optimization
Mode
Normal
Step by step
Mode
Shut down
Mode
Errors
Operator
Production
Constructor
Mode
Maintenance
Constructor
A Communicant Tool
COSMA
GUI
WAN
VPN
ADSL
Fix IP
Firewall
Dedicated
Ethernet network
Customer Ethernet
Network
COSMA
Supervisor
Ethernet
Process Control
Unit (1)
Process
Control Unit (2)
Ethernet
Device Control
(1)
Device
Control (2)
Pumping System
Reactor
TV
PTM
Dry Pump
ADP 122
RIE Reactor
Bottom Electrode
Pumping grid
Automatic
Match Box
RF Generator
Pump
Reactor Features
RIE reactor designed to fit with each customer application:
Reactor design from symmetrical (low ion bombardment) to
asymmetrical (strong ion bombardment),
Reactor design for thick (up to 100 mm) and thin substrates,
Cathode size up to 700 mm X 650 mm.
Real time access to the following plasma modes:
High Pressure Reactive Ion Etching (Isotropic),
Low Pressure Reactive Ion Etching (Anisotropic).
Some Process Specifications
Etch Rate
Selectivity Uniformity
(nm/min)
Process
Underlayer
Polyimide
Si3N4
200
>50
±5%
Si3N4
SiO2
80
3
±5%
SiO2
SiO2
50
1
±3%
Precise Monitoring
The latest submicron technology needs precise delayering:
Automatic endpoint detection,
CCD camera with magnification > 120 X,
Laser beam diameter ≤ 20 m.
A CCD camera and laser diode, in the same measuring
head, enables simultaneous visualization of the die surface
and the laser beam impact on it. A laser spot, of diameter 20
µm, facilitates the record of interference signals.
Signal
Laser Endpoint Detection
Laser beam
Photodiode
Time
Interferences
Reflected beam 1
Interface 1
Reflected beam 2
Interface 2
Refractive Index = n
Underlayer
Interferences lead to a periodic signal having a l/2n period versus time
Recap of Corial 700 Features
Very large area RIE reactor to achieve uniform etching
either of large area substrates or wafers in batch mode,
Operation in RIE mode Low and High working pressure,
Wide process range from isotropic to anisotropic,
Both fluorinated and chlorinated chemistries,
Clean etching of metals.