Transcript HRD Program - RMS VISION

Application Note:
CD Measurement
for FET Features
NGS 3500 Advanced Metrology System
RMS VISION SYSTEMS
Innovative Solutions for the Semiconductor Industry
RMS VISION SYSTEMS
Innovative Solutions for the Semiconductor Industry
CD Measurements
CONFIDENTIAL
RMS VISION SYSTEMS
Innovative Solutions for the Semiconductor Industry
CONFIDENTIAL
Image Data Set
Notes:
 20 High Resolution Images of the same site were used in the repeatability test
 Wafer was slightly moved between measurement to create realistic positional and focus variation
 No vibration isolation or special fixture was used in the test
RMS VISION SYSTEMS
CONFIDENTIAL
Innovative Solutions for the Semiconductor Industry
Data Summary – CD Measurement

< 0.01 micron Repeatability
4 seconds Processing Time
(80 measurements)

Notes:
• Gate Width was calibrated as 0.5 um.
• Other measurements were not calibrated.
Optics: 100x Objective (FOV ~ 90um x 75 um)
• Camera: High-Res. Color camera with 0.036 um/ pixel
•
RMS VISION SYSTEMS
Innovative Solutions for the Semiconductor Industry
CONFIDENTIAL
Chromatic
Edge Contrast
Technology *
* Patent Pending
This technology based on wavelength detection enables much better resolution for optical CD
measurement. Resolutions below 10 nm are possible with standard optical microscopy.

The edges are very sharp based on wavelength contrast. Due to optical resolution limit, the same
edge is blurred with noise and low contrast when light intensity (B&W) information is used.
