here - Antoine Wojdyla
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Transcript here - Antoine Wojdyla
Extreme ultraviolet lithography :
Pushing microchips down to the nanoscale
A Wojdyla
Center for X-Ray Optics - LBNL
December 12th, 2013
1
There’s plenty room at the bottom
• I don't know how to do this on a small scale in a practical
way, but I do know that computing machines are very
large; they fill rooms. Why can't we make them very
small, make them of little wires, little elements – and by
little, I mean little. For instance, the wires should be 10 or
100 atoms in diameter, and the circuits should be a few
thousand angstroms across.
– Richard Feynman (1959)
EUV Lithography - All Talk Considered
2
Transistors
• They are electron taps !
• Relays & vacuum tubes (“analog”)
• Solid state transistors (“digital”)
EUV Lithography - All Talk Considered
3
What is lithography ?
• (Photo) lithography
– “To write in stone”
• lithos (λίθος) “stone”
• graphein (γράφειν) “to write”
EUV Lithography - All Talk Considered
4
How do you make microchips ? (1/2)
Source : Mack book
Inverted microscope
EUV Lithography - All Talk Considered
5
Source : Mack book
How do you make microchips ? (2/2)
source : Intel
x 30
EUV Lithography - All Talk Considered
Intel Core
6
How do we make them ?
For, in order to work iron, a hammer is needed,
and the hammer cannot be forthcoming
unless it has been made;
but, in order to make it,
there was need of another hammer
and other tools, and so on to infinity
– Spinoza
• We don’t actually make microchips,
but we provide the tools to make them
A crane, as seen from the CXRO coffee room
EUV Lithography - All Talk Considered
7
Moore’s law
“Where a calculator on the ENIAC is equipped with 18,000 vacuum tubes and weighs 30 tons,
computers in the future may have only 1,000 vacuum tubes and perhaps weigh 1.5 tons.”
- Popular Mechanics (1949)
Source : ASML
EUV Lithography - All Talk Considered
8
Resolution is limited by the wavelength
• Resolution is limited by the wavelength
EUV Lithography - All Talk Considered
9
Why would you use Extreme UV ?
• Current wavelength : 193 nm (excimer)
– Go very low in resolution
– Use of multi-patterning :
xkcd
• lots of masks : lower yield,
higher costs
• New wavelength : 13 nm
– 15x smaller wavelength
– Materials are available
EUV Lithography - All Talk Considered
10
Challenges for EUV Lithography
source : Cymer
• Source
– Cyclotrons, FEL, Z-Pinch,
Laser-Produced Plasma
– Works in vacuum
• Optics
– Only in reflection
– Coating (thin film)
source : ALS
• Materials
– Appropriate polymers
EUV Lithography - All Talk Considered
11
A sense of scale (1/2)
• 8 nm feature size
– Compare it to the size of a red blood cell : 8 μm
– Compare to the width of a DNA strand : 2.3 nm
– Compare it to the size of an atom (12C) : 0.2 nm (VdW)
source : CXRO
EUV Lithography - All Talk Considered
12
10 μm
EUV Lithography - All Talk Considered
13
A sense of scale (2/2)
• 0.1 nm precision (~λ/100)
over the size of a mirror
• 1mm precision
over the size of Pacific ocean
“Oh man, it’s raining !”
EUV Lithography - All Talk Considered
15
Every perturbation is the enemy
• Pollutants
– Vacuum compatibility
– Clean room (dust)
• Vibrations
Effects of the dielectric permittivity of air vs. vacuum
(A Wojdyla, CXRO)
– “calm environments” already shake 1000x too much !
• Heat
• Aluminum’s CTE: 22 μm/m/K
Influence of temperature on the measurements (A Wojdyla, CXRO)
->Metrology is the key
“If you can measure it, you can make it.”
EUV Lithography - All Talk Considered
Photon-noise limited experiments
(CN Anderson, CXRO)
16
Getting indust-real
• First industrial tools shipped
– 18nm resolution
ASML NXE:330 Demo tool
EUV Lithography - All Talk Considered
17
Berkeley-Sematech MET 0.5NA
• To renew the current Micro Exposure Tool (MET)
• 0.5 Numerical Aperture
-> 8 nm resolution
Sematech members :
ASML, IBM, Intel, Texas Instruments,…
Berkeley Sematech MET 0.5NA
EUV Lithography - All Talk Considered
18
EUV Lithography - All Talk Considered
19
Designing, simulating, prototyping, tolerancing
wavefront sensing optical prototype
wafer leveling system
21
Conclusions
xkcd
• Next step in semi-conductor industry
is EUV lithography
• It’s not easy, because we have to overcome
Nature’s fundamental limits (so do you!)
and environmental factors
• We’ve reached the bottom
• What’s next in tech ?
– 3D chips, graphene transistors, spintronics, quantum computers…
EUV Lithography - All Talk Considered
22
Thank you for your attention
more at cxro.lbl.gov/MET
contact : [email protected]
Drawing from Nobel prizes