Transcript Slide 1

Deposition Thickness Experiments Using a Vacuum Chamber
Lawrence Livermore National Laboratory
María Rosa Rivera Roque
Research Supervisors: Shannon Ayers and Victor Sperry
Research Advisor: Scot Olivier
Educational Home Institution: Sistema Universitario Ana G. Méndez
OVERVIEW
Introduction to nanolaminate
 The goal of the experiments
 Vacuum chamber
 The development of the experiments
 Discussion of results
 Conclusion
 Acknowledgements and references
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Introduction
Nanolaminate
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Has been developed
for adaptive optical
correction.
This technology is
applicable.
Create thin, flexible
and lightweight
nanolaminate mirrors.
Deposition Thickness Experiments
Using a Vacuum Chamber
The goal of the experiments were to
characterize the deposition rate and
thickness profile for three elements.
ELEMENTS
Carbon
Zirconium
Copper
Vacuum Chamber
Create the deposition environment
 Inside it, begins the deposition of a film or
coating
 Three basic technologies for developing a
coating:
Ion plating
Evaporation
Sputtering
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Magnetron Sputtering Technology
Is a vacuum process
used to deposit very
thin films on
substrates.
It is performed by
applying a low
pressure gas to
create a plasma.
During the sputtering energized plasma and ions strike the
target and cause atoms from that target to be ejected with
enough energy to travel and bond with the substrate.
The Development of
the experiments
consist of:
The set up of the
experiment
Prepared a 60 inch
in diameter plate
Set up the vacuum
chamber and the
computer
Discussion of
results and
conclusions
Perform the
experiment
Add wafers
Put the plate inside
the vacuum
chamber
Parameters
of the experiments
Use the
profilometer
Analyze thickness
curve of the
elements
No rotation and
No translation
(Static)
Depositing
Pure
Power
Run
Experiment
Zirconium
3600 watts
13:10 min
Carbon
500 watts
105 min
Copper
500 watts
28:45 min
Discussion of Results
The profilometer is a thin film thickness measuring tool.
It is used to measure the thickness of the deposition at
a specific location.
Discussion of Results
Thickness Curve for Carbon Target
Thickness ProfileCurve
For VLOC Copper Target V06-027
Thickness Curve for Copper Target
1400
Thickness in Angstroms
5000
4000
Thickness in Angstroms
Thickness in Angstroms
4500
1200
1000
800
3500
3000
2500
2000
600
1500
400
1000
200
500
Distance in cm from centerline of target
0
50
0
-40
40
30
20
10
0
-20
-10
0
10
20
30
40
Distance in cm from centerline of target
Thickness Curve for Zirconium Target
Thickness profile
For VLOC Zirconium Target - Run V06-026
8000
7000
Thickness in Angstroms
6000
5000
4000
3000
2000
1000
0
80
60
40
20
0
-20
Distance in cm from centerline of target
-40
-60
Distance in cm from centerline of target
-80
Thickness in Angstroms
9000
∫ x2 dx
-10
Distance in cm from centerline of target
-30
-20
-30
-40
-50
Discussion of Results
TARGET
60’’ DIAMETER
PLATE
45/8’’
WAFERS
Higher angles for sputtering - the deposition will be spread less on the
wafers.
Conclusions
These experiments are important to know
how thick the nanolaminate mirror is going
to be.
 With these thickness profiles and rates we
can also calculate for future experiments:
the rotation (revolution per minute)
linear translation (cm per minute)
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Acknowledgements
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This project is supported by the National Science Foundation Science and
Technology Center for Adaptive Optics, managed by the University of
California at Santa Cruz under cooperative agreement No. AST – 9876783.
REU by the HACU Hispanic Scientist Development Program.
Sperry, Victor – Research Supervisor
Ayers, Shannon – Research Supervisor
References
http://www.angstromsciences.com
 http://www.llnl.gov
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