Development of Tribological Coatings for Cryocoolers Task III.4

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Transcript Development of Tribological Coatings for Cryocoolers Task III.4

FLORIDA SOLAR ENERGY CENTER
A Research Institute of the University of Central Florida
Development of Tribological
Coatings for Cryocoolers
Task III. 4 Hydrogen Storage for Spaceport and
Vehicle Applications
Neelkanth G. Dhere and Anil Pai
Titanium Nitride (TiN) Coatings
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TiN samples by DC magnetron sputtering
have been prepared for measurement of
microhardness with the assistance of Dr. Raj
Vaidyanathan and his colleagues.
Measurements will be carried out after
adjustment of the microhardness system setup
for making the specific measurements.
Titanium Nitride (TiN) Coatings
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Mask required for deposition of TiN film on three
bumps on 1cm x 1 cm silicon wafer to minimize the
contact area between two rubbing samples and
providing more accurate coefficient of friction and
wear measurements has been procured.
Deposition of the film on silicon wafer is being
planned in consultation with Dr. Sundaram.
Afterwards, the coefficient of friction and wear
measurements will be carried out with the assistance
of Dr. Quanfen Chen and his colleagues at UCF.
Mask Sketch
1cm * 1cm Si Wafer
0.75 mm cylindrical
bumps
MWCVD System
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Microwave plasma applicator with power
supply has been ordered
After receiving the plasma applicator the
Microwave assisted plasma chemical vapor
deposition system (MWCVD) will be constructed
After the installation of MWCVD system, DLC
coatings will be prepared and characterized.
TiN films on copper substrates
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TiN films were deposited on copper substrates by DC
magnetron sputtering.
During soldering of a resistor to the sample, the
coating turned a different color and might have peeled
off.
At high temperatures, TiN films on copper substrates
are known to degrade due to conversion to TiO2.
This results in color change and fracture of films due to
thermally induced stresses.
Reference is being provided.
Tasks to be Accomplished
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Characterization of bilayer coatings of TiN and MoS2 on
a glass substrate is being planned.
Depositions of TiN on aluminum substrates will be
carried out for microhardness, wear and coefficient of
friction analysis at UF.
Coefficient of friction and wear measurements at UCF on
Si wafer will also be carried out with the assistance of Dr.
Chen and his colleagues.
After the installation of MWCVD system, DLC coatings
will be deposited and characterized.
A new combined Cryocooler proposal with tribological
coatings must be discussed and prepared.