Stamp metallization layers
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Transcript Stamp metallization layers
Flip Chip/Bumping Process
at VTT
By Jaakko Salonen
([email protected])
Last modified March 16, 2007
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
VTT's Flip
Chip Process:
Overview
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Flip Chip Bonding With Solder Bumps
Solder bumping is done by
electroplating for whole wafers.
The wafers are then diced, and the
individual chips are flip chip
bonded together.
Typical bump diameter: 20...30 um
Typical bump pitch: 50...200 um
Bump/pixel count per ROC: ~2,000...65,000
Area array type interconnecting
technology is ideal for hybridizing pixel
sensors with readout chips.
Sensor chip, typically hi-res (1 1 1) silicon.
Readout chips, 0.25-um CMOS, typically 1
to 10 ROC’s per sensor chip.
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Main Process Steps
1.
Incoming Inspection & Wafer Cleaning.
2.
Sputtering of Field Metals.
3.
Photolithography Step.
4.
Electroplating of UBM & Solder.
5.
Stripping of Photoresist.
6.
Etching of Field Metal 2.
7.
Etching of Field Metal 1.
8.
Solder Reflow.
9.
Thinning of Readout Wafers (optional).
10.
Dicing.
11.
Flip Chip Bonding.
Steps marked in red are done in a
Class-10 clean room.
Steps marked in blue are done in a
Class 10,000 clean room.
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Flip Chip Hybridization 1(4)
Sensor & Readout wafers
Sensor wafer
Readout IC wafer
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Flip Chip Hybridization 2(4)
Bumping process (at wafer level)
Sensor wafer
Solderable pads
Readout IC wafer
Solder bumps
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Flip Chip Hybridization 3(4)
Dicing & chip pick-up
Detector wafer
Readout IC wafer
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Flip Chip Hybridization 4(4)
Flip chip bonding (chip-by-chip)
Sensor chip
Readout chip
Readout chip
Sensor chip
Hybridized sensor/readout
(detector) assembly
Sensor & readout chips
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
VTT's Flip
Chip Process:
Step by Step
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Bumping Process
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Incoming Inspection
Zeiss Axiotron 2 Microscope
•Visual incoming inspection of wafers is done before
bumping process.
•After inspection, wafers are cleaned using liquid
solvents and ultrasound.
Dirt particle on customer's readout wafer
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Sputtering of Field Metals
Von Ardenne CS730S Sputterer
•Sputtered Ti-W/Cu (40 nm/700 nm) layer is used as
field metal for electroplating.
•Light in situ sputter etching step is used to remove
native oxide from Al contact pads.
•Von Ardenne CS730S is used for 4", 5", and 6"
wafers.
•TEL Eclipse Mk. IV is used for 8" wafers.
TEL Eclipse Mk. IV Sputterer
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Photolithography
Suss MA200 & MA6 Mask Aligners
•Patterned 18-mm thick photoresist is used to define
the bump sites on the wafers.
•Suss MicroTEC ACS200 Automated Coating System
is used to coat wafers with photoresist.
•Suss MicroTEC MA6 Mask Aligner is used to expose
4", 5", and 6" wafers.
•Suss MicroTEC MA200 Mask Aligner is used to
expose 8" wafers.
Suss ACS200 PR coating system
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Electroplating
Wet bench for electroplating
•Nickel is first electroplated in the holes in the photoresist
•Solder is then electroplated on top of the nickel.
•Essentially the same process is used for both the sensor and the
readout side; only the volume of the solder is different.
Wafer holder for electroplating
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Stripping of Photoresist
•After electroplating, photoresist is stripped away using
solvents and ultrasound on automated wet bench.
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Etching of Field Metals
•The field metals, which short-circuited the bump
sites to one another during electroplating, are
removed by wet etching.
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Solder Reflow
ATV SRO-704 Reflow Oven
•ATV SRO-704 Reflow Oven is used for solder bump reflow.
•Formic acid ambient reduces oxides on bump surfaces.
Bumps after reflow
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Wafer Thinning
Strasbaugh 7AF Back Grinder
Strasbaugh 6DS-SP CMP
•Strasbaugh 7AF Intelligent Grinder is used for back
grinding.
•Strasbaugh 6DS-SP CMP Planarizer is used for CMP
polishing.
•A layer of protective tape is used to protect the
bumps and the front side of the wafer.
200 mm Si wafer back ground &
polished to thickness of 150 mm
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Dicing
Disco DFD651 Dicing Saw
•Disco DFD651 Dicing Saw is used for dicing.
Wafers are laminated on tape/
tape frames for dicing
DFD651 in action
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Flip Chip Bonding
Suss FC150 Flip Chip Bonders
Close-up of bonded chips
•Flip chip [tack] bonding is performed on
two Suss MicroTEC FC150 Flip Chip
Bonders.
•A post-tack bonding 'assembly reflow' for
self-alignment is done in the ATV SRO-704
Reflow Oven in a formic acid ambient.
Suss FC150 in use
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Summary
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
Summary
•
•
An overview of VTT's flip chip process was given.
Electroplating is used to deposit solder on wafers at sites
defined by photoresist.
•
Readout wafers can be optionally thinned after bumping.
•
All process steps are performed in house.
•
4", 5", 6", and 8" wafers can be processed.
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007
VTT Technical Research Centre of Finland
Tietotie 3, Otaniemi, Espoo, Finland
The End.
Thank you for your
attention.
J. Salonen, “Flip Chip Bumping Process at VTT" [presentation for GPG], 16-March-2007