MTII Company Profile Presentation
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Transcript MTII Company Profile Presentation
Pioneers in Non-contact Measurement
MTI Instruments, Inc.
Founded in 1961--now a
public company listed on
NASDAQ
Designs, manufactures and
markets non-contact
measurement instruments and
systems for manufacturing
and laboratory applications
Company Profile
We apply our technical expertise in electronics,
optics and software to meet the precision
measurement needs of end-users and OEMs
Key attributes of our products:
Non-contact
High resolution
Custom probe sizes
High frequency response
Accurate
Reliable
Global sales, service and support network
Total customer commitment
Company Profile
MTI Instruments, Inc.
PBS Group
Portable engine balancing
systems for the aircraft
industry
General Instruments
Group
Semiconductor
Products Group
Measurement probes and
electronics for laboratory
and industrial applications
Measurement systems
designed specifically for
the semiconductor
industry
Core Technologies
MTI Instruments employs three unique sensing
technologies to meet the diverse measurement needs of
our customers
Accumeasure - Capacitance
Displacement
Thickness
Micro-positioning
Microtrak - Laser triangulation
Robotic Control
Flatness
Dimensional Measurement
Fotonic - Fiber Optic
Vibration
Positioning
Modal Analysis
Semiconductor Products Group
MTI Instruments offers a complete line of semiconductor
metrology systems to meet the stringent requirements
of the industry
Proforma™ 300 - Manual wafer thickness measurement
Proforma™ 300GR - Manual thickness and resistivity in
single compact design
Proforma™ 200 SA - Semi-Automated wafer surface
mapping
Proforma™ AutoScan 200 - Fully automated wafer
mapping system
PROFORMA Wafer Thickness
Measurement Systems
Based on MTI’s proprietary Push-Pull capacitance
technology
Ideal for both semiconducting and semi-insulating
materials
Manual, semi-automated and fully-automated models for
laboratory and manufacturing process applications
Push-Pull Probes
Single Sensing Face
Constant current supply, linear
voltage change based on air gap
Electrical grounding of target
required
Dual Sensing Element
No electrical grounding of target
required
Ideal for highly resistive materials
Semiconductor
Applications
Wafer Specifications
Material: Semiconducting and Semi-Insulating
Diameter: 50 - 200 mm.
Surface: As-Cut, Lapped, Etched, Polished, Patterned
Flat/Notch: All SEMI standard Flat(s) or Notch
Conductivity: P or N type
Mounting: Bare Wafer, Sapphire/Quartz, Tape
Process Monitoring
Slicing: Blade and wire guide degradation monitoring
Lap/etch and Polishing Removal Rates
Backgrinding
Final Inspection
PROFORMA 300
Manual, non-contact wafer
thickness gage
Thickness, TTV, continuous
and 5-point measurement
Measures diverse materials
without re-calibration
Output data to any PC
Portable, easy to set up and
operate—ideal for SPC
PROFORMA 300
Key Features
Teflon wafer stage for
easy non-abrasive
positioning
High-resolution
LCD display
Proprietary
Push-Pull™
probe
technology
Adjustable stage for
precise leveling
On-board microprocessor
for accurate, repeatable
measurement
Menu-driven for fast, easy setup
PROFORMA 200 SA
Semi automated operation
Windows® based control
interface
Measures thickness, bow,
warp, global and site flatness,
TTV
Complete wafer surface
mapping
Multiple chucks for all wafer
sizes
Economical alternative to
fully automated system
PROFORMA AUTOSCAN 200
Fully automated wafer
measurement system for
semiconducting and semiinsulating materials
Thickness, TTV, bow, warp,
resistivity, site and global
flatness
Outstanding accuracy and
repeatability
Integrated, modular design
PROFORMA AUTOSCAN 200
Standard Windows NT user interface for easy set-up.
Choose from standard or user-programmable wafer scan
patterns to mach your measurement needs.
PROFORMA AUTOSCAN 200
Precise site flatness measurements are obtained
through programmable wafer and site geometries.
PROFORMA AUTOSCAN 200
Automated, full surface scanning allows for
3-dimensional imaging of wafer profile.
PROFORMA AUTOSCAN 200
System Features
Completely automated wafer handling and surface
scanning
Measures all wafer materials --Si, Ge, GaAs, InP
Full 1000 um thickness measurement range without recalibration
Measures wafers from 75-200 mm. in diameter;
100 wafer/hour throughput
Universal robot end effector
Automatic detection of wafer diameter
Laser cassette scanning detects crossovers, empty slots,
broken wafers
PROFORMA AUTOSCAN 200
System Features (continued)
SEMI compliant modular design
Integrated control system
Ethernet network interface
Customized data reporting
Enclosed environment for Class 10 compatibility
Optional laser OCR mark reading and resistivity modules
The new standard for measuring semiconducting
and semi-insulating wafers