LV_Power_MOSFET - Renesas e-Learning

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Transcript LV_Power_MOSFET - Renesas e-Learning

Intermediate
Low Voltage Power MOSFETs
Renesas Electronics America Inc.
Christopher Lee, PMD & GP Products Group
[email protected]
408-649-4703
May 2011
Rev.1.0
Confidential
Course Introduction
 Purpose
This course provides intermediate knowledge of low voltage Power MOSFETs.
 Objective
 Learn what a power MOSFET is and how it works.
 Understand how to read a MOSFET datasheet.
 Understand basic MOSFET characteristics.
 Content
 35 pages (except exam. Session)
 5 questions
 Learning Time
 40 minutes
Confidential
MOSFETs
 MOSFET’s
 Packaging Trends
 Characteristics and Datasheet
3
© 2010 Renesas Electronics America Inc. All rights reserved.
What is a Power MOSFET?





MOSFET: metal–oxide–semiconductor field-effect transistor
MOSFET is a transistor used for amplifying or switching electronic signals
In MOSFETs a voltage on the oxide-insulated GATE [G in the diagram below] induces a
conducting channel between the two other contacts called SOURCE [S] & DRAIN [D].
Gate voltage is denoted Vg
A Power MOSFET can switch and conduct very high power levels, an is useful in power
conversion circuits (i.e. boost voltage, decrease voltage , convert DC to AC, etc.)
ID
D
G
S
4
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D
VG
G
S
Confidential
What is a Power MOSFET?



The threshold voltage is the minimum VG at which a conducting channel forms.
For switching applications such as for switching voltage regulators, the VG is modulated
between on (> saturation voltage of the channel) and OFF …
For switching applications, this channel between the Drain and Source can be thought
of a resistor (RDSON) that is controlled by the VG in power applications.
ID
D
G
S
5
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D
VG
G
S
Confidential
Packaging Trends in LV MOSFETs
 MOSFET’s
 Packaging Trends
 Characteristics and Datasheet
6
SMD Packages
Confidential
Footprint Compatibility
Bottom Side Cooling
Double-Sided Cooling
IR – DirectFET
Bottom
Bottom
Bottom
Renesas
Renesas – LFPAK-i
(Hitachi, NXP)
LFPAK-i
LFPAK-i
D
D D D
Top
Bottom
Bottom
Bottom
S S S G
Bottom
WPAK
Solutions from Renesas : (LFPAK/LFPAK-i, WPAK) + WINFET/BEAM MOSFETs
8
Confidential
Space Saving Packages
Down sizing
SOP-8
HVSON
-64% (5x6 ->3.3x3.3)
WPAK
mini-HVSON
HWSON3030
[ 5x6 ]
[ 3.3x3.3 ]
[ 5x6 ]
LFPAK
LFPAK-i
Compounded Hi/Lo MOSFETs
-56% (5x6 ->3x4.4)
-50% (5x6x2 ->5x6x1)
WPAK-Dual
Down
sizing
[ 5x6 ]
[ 5x6 ]
[ 5x6 ]
Vcc
Driver /
Controller
[ 3x4.4 ]
Vin
Hi
L Vout
Lo
Integrated Power IC
-44% (8x8 ->6x6)
-29% (5x6x3 ->8x8)
QFN56
Down
sizing
[ 8x8 ]
9
HWSON3044
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Confidential
QFN40
[ 6x6 ]
Package Roadmap for High Current Application
10
Confidential
Package Resistance
Lower PKG resistance  Reduces Conduction loss!
Cu wire
Au wire
Lead Frame Cu Wire
(Source, Gate) Die
Lead Frame Au Wire
(Source, Gate) Die
Die pad (Drain)
Die pad (Drain)
~1.0mW
AL ribbon
AL ribbon
~0.5mW
Wireless
lead
(Source, Gate) Die
LFPAK
LFPAK-i
Die pad (Drain)Au bump
11
SOP-8
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Die
Die pad (Drain)
SOP-8
WPAK
WPAK-Dual
HWSON3044
HWSON3030
Cu clip
Cu clip
Die
Die pad (Drain)
Confidential
HVSON
mini-HVSON
3x3mm
Observed Trend Toward Integration
- Another Solution from Renesas VCIN
Driver
REG5V BOOT GH VIN
SBD
UVL REG5V
12Vin
DISBL
CPU
3-state
Input
PWM
CGND
Overlap
Protect.
VLDRV
VSWH
GL PGND
QFN56
QFN40
Down
sizing
[ 8x8 ]
Controller
Top view
Bottom View
[ 6x6 ]
A “System in Package”, SiP
12
Confidential
Characteristics & Datasheet
 MOSFET’s
 Packaging Trends
 Characteristics and Datasheet
13
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MOSFET Characteristics
 Break down voltages (VDSS, VGSS)
 On Resistance (RDSON)
 Switching chacteristics
 Gate Charge (QG, QGD)
 Capacitances (CISS, COSS, etc)
 Avalanche
 Body Diode
 ASO  Area of Safe Operation
14
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Power MOSFET Absolute Maximum Ratings
15
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MOSFET Electrical Characteristics
Value
Parameter
Symbol
Unit
Temperature
Dependence
Attention
for Design
Min
Typ
VDSS
60
-
-
ID=10mA, VGS=0
V
IDSS
-
-
10
VDS=60V, VGS=0
uA
Gate to Source Leak Current
IGSS
-
-
 0.1 VGS=20V, VDS=0
uA
High dependence on
temperature, but low loss
Protection diode built in products
are from scores of nA to scores
of mA. The guarantee is 10uA.
Gate Source Cutoff Voltage
VGS(off)
1.0
-
2.5
VDS=10V, ID=1mA
V
Influence on noise at operating
time of SW and SW time tr and tf
Forward Transfer Admittance
IYfsI (gm)
55
90
-
ID=45A, VDS=10V
S
S = siemens = 1/W
Drain Source on Resistance 1 RDS(on)1
-
4.3
5.5
ID=45A, VGS=10V
mW
Drain Source on Resistance 2 RDS(on)2
-
6.0
9.0
ID=45A, VGS=4V
mW
Input Capacitance
CISS
-
9770
-
VDS=10V
pF
Output Capacitance
COSS
-
1340
-
VGS=0
pF
Reverse Transfer Capacitance CRSS
-
470
-
FSW=1MHz
pF
Drain-source
destruction voltage
Zero Gate Voltage
Drain Current
Note: VDS(off) = VTH
16
CISS = CGS + CGD
COSS = CDS + CGD
CRSS = CGD
© 2010 Renesas Electronics America Inc. All rights reserved.
Max
Test
Condition
(Ta=25degC)
It is related to on-resistance
This is the most important
parameter to decide on-loss.
Pay attention to rise in curve
with temperature
There is a VDS dependency here.
Indicate drive loss at operating
time of analog
There is VDS dependency.
Influence on fall time tf at light
load time.
There is VDS dependency.
Influence on SW time tr and tf
: Have positive temperature coefficient.
: Have negative temperature coefficient.
Confidential
Important MOSFET Device Design Parameters
MOSFET Resistances
Drain
G
RWIRE
RGI
VDSS
Gate
RG
RGI
RDS(si)
Body
Diode
S
Rch
N+
P+
Repi
Epi
Rsub
NN++
Substrate
D
VGSS
RWIRE
Parasitic NPN
Bipolar Transistor
Structure of N-Channel Trench Cell
RDS(si) = Rch + Repi + Rsub
Source
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Vertical MOSFET Cells
Return
Overall RDS(on) Components
Planar
S
G
N + (S)
P (CH)
N - (Epi)
N
RWIRE
++
(Sub)
Trench
G
Rch
Repi
Rsub
S
VDSS
30V
60V
200V
Rch
30%
10%
5%
Repi
40%
80%
94%
Rsub
30%
10%
1%
N + (S)
P (CH)
N - (Epi)
N
++
D
(Sub)
D
Drain of the Si is glued to the tab
with silver epoxy, so the contribution
of that resistance is negligible
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Resistance ratio for Trench MOSFET
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The Resistive Components
of the overall RDS(on) Structure
of a Vertical Power MOSFET
RDS(ON) = Rch + Repi + Rsub + RWIRE
Confidential
Temperature dependency of On-Resistance, RDS(ON)
RDS(ON) - TC characteristic (2SK3418)
19
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Important MOSFET Device Design Parameters
MOSFET Package Parasitic
Drain
LD
G
RTAB
S
Rgi
N+
P+
Gate LG
RG
Epi
Substrate
NN++
D
Structure of N-Channel Trench Cell
RWIRE
Ls
Packaging
Source
20
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Important MOSFET Device Design Parameters
MOSFET Capacitances
Drain
G
Rgi
VDSS
CGD
CDS
Gate
N+
P+
Epi
Substrate
CGS
S
NN++
D
Structure of N-Channel Trench Cell
VGSS
Source
21
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CISS = CGS + CGD
COSS = CDS + CGD
CRSS = CGD
Confidential
Important MOSFET Device Design Parameters
MOSFET Body Diode
Drain
G
S
ID
Body
Diode
trr
Gate
Rgi
VDSS
N+
P+
Epi
IDR
Substrate
NN++
D
VGSS
Parasitic NPN
Bipolar Transistor
Structure of N-Channel Trench Cell
Source
22
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The Characteristics of a MOSFET Body Diode
1.
A parasitic body diode is built in the Power MOSFET between
the source and drain. The maximum current rating of this diode,
IDR, is the same value as the maximum rating of the MOSFET
forward drain current, ID
2.
This diode shows that it has the same characteristic for forward
voltage as an ordinary diode in the case of zero bias for the gate
drive voltage, VGS=0
3.
If the gate drive voltage, VGS, has a positive bias, as in the case
of N-channel MOSFET. Then, VSD will be a voltage that is
determined by the on-resistance RDS(on) (VSD = ID x RDS(on)), as
shown on the figure to the right. Therefore, it is possible to get
very low forward voltage similar to a Schottky barrier diode
(SBD).
4.
23
=0V
By taking advantage of such a characteristic, the body diode
can be used to benefit the application in the following:
a)
Load switches for protection against reverse connection of
battery
b)
Hot swap circuits of redundant method for switching power
supply (n+1)
c)
Replace external diodes in motor driving circuit bridges
d)
Secondary synchronous rectifier circuits in switching power
supplies
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IDR - VSD characteristic (2SK3418)
(N-channel)
Confidential
Schottky Barrier Diode
Drain
Body Diode
SBD
Gate
Source




Non-overlap/Dead Time to avoid cross conduction (“shoot-through”)
Body diode of a synchronous switch conducts during dead time
Body diode is lossy and is slow to turn on/off
A Schottky diode (SBD) is used in parallel with the MOSFET
 Reduced the forward voltage drop from ~0.7V to ~0.2V
 Reduces losses from body diode turn on and reverse recovery losses
 Limits overshoot on turn on
 Non-overlap time conduction can be significant at high switching
frequencies
24
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SBD Reduces Turn-on Spike Noise
Lo:RJK0381DPA
(Built in SBD)
Lo:RJK0351DPA
(without SBD)
Vg(H)
Vgs(L)
Vds(L)
Suppressing
Spike voltage
VP=27.2V
VP=22.6V
Vds(L)
-17%
Vg(H)
Vgs(L)
Confidential
Drain-Source Saturation Voltage, VDS(ON)
VDS(ON) depends on the Gate Drive Voltage, VGS, and the Drain current, ID
VDS(ON) = ID x RDS(ON)
VDS(on) - VGS characteristic
(2SK3418)
26
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QG, QGD, ig(peak), P(Drive Loss) & Fall Time (tf)
definitions
QG @ (VGS=DVGS)
1. Total gate charge, QG, is the point
where the gate driving voltage, VGS,
becomes equal to the Driver output
voltage (DVGS) at the gate of the
MOSFET
V
QGS
VGS
QGD
DVGS
IG(peak) = QG/t
P(drive loss) = FSW *QG*VGS
QTH
VTH
(1)
QG
(2)
3.
QGD corresponds to mirror capacitance, CRSS
and its value depends on the power supply
voltage VDS. Recall that CRSS = CGD
4.
QGD is the parameter that greatly influences a
devices switching fall time, tf,
where RS = RDRIVER, RG = RPCB+Rgi:
.
tf =.
(RS + rg)*QGD
VGS(on) - VTH
VGS(on)
VGS (V)
2. QG is the parameter that controls
gate peak current, IG(peak), from the
MOSFET driver and the drive loss,
P(drive loss)
VDS (V)
DS
ln VGS(on)
VTH
Gate Charge
(a)
Input Dynamic Characteristic
(2SK3418)
Q = CISSVGS = integral (IG * dt) = I*t = I*1/FSW
I = Q*FSW
P= IV =Q*FSW *V = C*FSW *V2
(3)
5. The fall time, tf, controls the switching loss and tf is computed using formula (3) above. Both QG and QGD are
important items when designing for high frequency operation.
. For high-speed switching (over FSW=100kHz)
applications, the smaller the RON/QG or RON/QGD the more efficiency the MOSFET device will become
27
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Avalanche Breakdown
It is a phenomenon that can occur in both insulating
and semiconductor materials.
 It is a form of electric current multiplication that
can allow very large currents to flow within
materials which are otherwise good insulators.
 It is a type of electron avalanche.
The Avalanche process occurs when the carriers in
the transition region are accelerated by the electric
field to energies sufficient to free electron-hole pairs
via collisions with bond electrons.
28
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Avalanche - Destruction Failure Modes
VIN
IOUT
L
D
VOUT
IL
C
When the current through the output inductor is quickly turned
off, the magnetic field of the inductor induces a counter
electromagnetic force, EMF, that can build up a high VDS
voltage across the MOSFET. The full buildup of this induced
voltage may exceed the rated breakdown voltage, VDSS, of
the MOSFET and result in the catastrophic failure of the
MOSFET.
Two failure modes exist when MOSFETs are subjected to
unclamped inductive switching, UIS. These two failure
mechanisms are defined as either 1) the active Mode 1 or 2)
the passive Mode 2.
1.The first, or active Mode 1, results when the avalanche
current actively forces the parasitic bipolar transistor into
conduction and turns it on. Today, MOSFETs are being
manufactured in which the parasitic bipolar transistor never
turns on and Mode 1 failures do not occur
2.The second, or passive Mode 2, results when the
instantaneous chip temperature reaches a critical value. At this
elevated temperature, a “meso-plasma” forms within the
parasitic NPN bipolar transistor and causes catastrophic
thermal runaway. The passive mechanism is, therefore,
identified as that failure mode not directly attributed to
avalanche currents.
Parasitic Bipolar Transistor
29
In either of the first or the second cases, the MOSFET is
destroyed.
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Safe Operation Area, SOA, Definitions
1
3
2
4
5
SOA for the (2SK3418)
30
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