Transcript CMOS FABRICATION TECHNOLOGY

CMOS Fabrication
(with extended comments)
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CMOS FABRICATION TECHNOLOGY
The following discussion will concentrate on the wellestablished CMOS fabrication technology, which requires that
both n-channel (nMOS) and p-channel (pMOS) transistors be
built on the same chip substrate. To accommodate both nMOS
and pMOS devices, special regions must be created in which
the semiconductor type is opposite to the substrate type.
These regions are called wells or tubs. A p-well is created in an
n-type substrate or, alternatively, an n- well is created in a ptype substrate. In the simple n-well CMOS fabrication
technology, the nMOS transistor is created in the p-type
substrate, and the pMOS transistor is created in the n-well,
which is built-in into the p-type substrate.
Oxide
Isolation
G
-VSS
n+
S
D
D
p+
p+
n+
G
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p-well
p-MOSFET
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n-MOSFET
+VDD
p+
CMOS FABRICATION TECHNOLOGY
The simplified process sequence for the fabrication of
CMOS integrated circuits on a p- type silicon substrate is
shown.
•
The process starts with the creation of the n-well regions for
pMOS transistors, by impurity implantation into the substrate.
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Then, a thick oxide is grown in the regions surrounding the
nMOS and pMOS active regions.
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The thin gate oxide is subsequently grown on the surface
through thermal oxidation.
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These steps are followed by the creation of n+ and p+
regions (source, drain and channel-stop implants).
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Finally the metallization is created (creation of metal
interconnects).
Metallization
Oxide
Isolation
G
-VSS
n+
S
D
D
p+
p+
n+
G
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n+
p-well
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+VDD
p+
Basic Processing Steps
Note that each processing step requires that
certain areas are defined on chip by appropriate
masks. Consequently, the integrated circuit may be
viewed as a set of patterned layers of doped silicon,
polysilicon, metal and insulating silicon dioxide. In
general, a layer must be patterned before the next
layer of material is applied on chip. The process used
to transfer a pattern to a layer on the chip is called
lithography.
The sequence starts with the thermal oxidation
of the silicon surface, by which an oxide layer of
about 1 micrometer (1000 nm) thickness, for
example, is created on the substrate, see (b). The
entire oxide surface is covered with a layer of
photoresist, which is a light-sensitive, acid-resistant
organic polymer, initially insoluble in the developing
solution (c). The photoresist material is exposed to
ultraviolet (UV) light, the exposed areas become
soluble so that the they are no longer resistant to
etching solvents. To selectively expose the
photoresist, we have to cover some of the areas on
the surface with a mask during exposure. Thus, when
the structure with the mask on top is exposed to UV
light, areas which are covered by the opaque features
on the mask are shielded. In the areas where the
UV light strikes the photoresist, it is “exposed”
and becomes soluble in certain solutes (d).
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PhotoResist
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PhotoResist normally comes in powder form, which is insensitive to
light. It is reconstituted into liquid form by adding a solvent, typically
alcohol.
The wafer is mounted on a turntable, spinning slowly, and the
photoresist is discharged into its center. Centrifugal force spreads
the resist outward across the wafer. The thickness that remains on the
wafer is a function of the rate of wafer spin and the viscosity of the
photoresist. The thickness is monitored by light diffraction, which is
used to adjust the spin rate to reach the correct PR thickness.
Phase Interference gives
Photoresist Thickness
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After the PR is applied, the wafer is heated (~160C) to evaporate the
solvent, leaving a smooth solid coating.
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PhotoResist
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The wafer is protected from light, and is put into the
photo-lithography tool. Light is focussed on the
wafer, delineating the IC pattern.
The wafer is removed and immersed in a
Developer Solution. If the PR is “positive” resist,
then those areas which received light will dissolve
away. Negative resist reacts the opposite way, with
those areas which were NOT exposed to light being
dissolved. This step will leave holes in the resist
layer.
The wafer is then heated to harden the patterned
resist so that it will withstand immersion into acids.
A typical hardening bake is ~300C.
The wafer then re-enters the processing line, for
either etching or deposition in the patterned
holes. In rare cases, the photoresist is not
adequate as a mask itself, and the patterns are
processed to make a more robust mask, e.g. of
thick SiO2 (for very high energy implants) or Si3N4
for solvent etches which also attack PR.
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Photo Lithography
Exposure Tool
PhotoResist
PhotoResist is used for two functions:
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•
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Delineation for Etching. A blanket deposition is made on the
wafer, then photoresist patterning covers the areas to be SAVED.
After developing, the wafer is etched and all parts NOT
COVERED by photoresist are removed.
Delineation for Deposition. For ion implantation, areas are
opened for doping the silicon. The photoresist absorbs all ions
except for the areas which are open. In these areas (e.g. Drain or
Source wells) the ions penetrate into the silicon.
A second Deposition function for photoresist is for patterning
thin layers which adhere readily to the wafer. For example, a thin
layer of Ti (200A) may be deposited through a PR mask to act as
“glue”. The PR openings are so steep, that the Ti film is
discontinuous at the edges of the openings. When the PR is
removed, it automatically lifts off the blanket Ti deposition, leaving
behind Ti only in the PR holes. This process is called deposition
processing by “Lift Off”.
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Basic Processing Steps
The type of photoresist which is initially
insoluble and becomes soluble after exposure
to UV light is called positive photoresist.
Following the UV exposure step, the
unexposed portions of the photoresist can be
removed by a solvent. Now, the silicon dioxide
regions which are not covered by hardened
photoresist can be etched away either by using
a chemical solvent (HF acid) or by using a dry
etch (plasma etch) process (e). Note that at the
end of this step, we obtain an oxide window
that reaches down to the silicon surface (f). The
remaining (unexposed) photoresist can be
stripped from the silicon dioxide surface by
using another solvent, leaving the patterned
silicon dioxide feature on the surface, see (g).
The fabrication of semiconductor devices
requires several such pattern transfers to be
performed on silicon dioxide, polysilicon, and
metal. The basic patterning process used in all
fabrication steps, however, is quite similar to
the one shown. examined.
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Basic Processing Steps
The result of a single lithographic
patterning sequence on silicon dioxide,
without showing the intermediate steps.
Compare the unpatterned structure
(top) and the patterned structure
(bottom). It took 9 steps to make this
simple hole:
1. Oxidize silicon surface
2. Deposit photoresist
3. Anneal photoresist
4. Mount mask above silicon
5. Expose to UV light
6. Develop photoresist
7. Etch photoresist exposed to UV
8. Etch SiO2 through photoresist hole
9. Remove photoresist
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Making a CMOS Device - 1
•
The process starts with the oxidation of the silicon
substrate (a), in which a relatively thick silicon dioxide
layer (5000A), also called field oxide, is created on
the surface (b). Then, the field oxide is selectively
etched to expose the silicon surface on which the MOS
transistor will be created (c). Following this step, the
surface is covered with a thin, high-quality oxide layer
(25A), which will eventually form the gate oxide of the
MOS transistor (d). On top of the thin oxide, a layer of
polysilicon (polycrystalline silicon, 3000A) is deposited
(e). Polysilicon is used both as gate electrode material
for MOS transistors and also as an interconnect
medium in silicon integrated circuits. Undoped
polysilicon has relatively high resistivity. The resistivity
of polysilicon can be reduced, however, by doping it
with impurity atoms.
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After deposition, the polysilicon layer is patterned
and etched to form the interconnects and the MOS
transistor gates (f). The thin gate oxide not covered by
polysilicon is also etched away, which exposes the bare
silicon surface on which the source and drain junctions
are to be formed (g). The entire silicon surface is then
doped with a high concentration of impurities, either
through diffusion or ion implantation (in this case with
donor atoms to produce n-type doping).
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Making a CMOS Device - 2
•
(h) shows that the doping penetrates
the exposed areas on the silicon surface,
ultimately creating two n-type regions
(source and drain junctions) in the p-type
substrate. The impurity doping also
penetrates the polysilicon on the surface,
reducing its resistivity. Note that the
polysilicon gate, which is patterned before
doping actually defines the precise location
of the channel region and, hence, the
location of the source and the drain
regions. Since this procedure allows very
precise positioning of the two regions
relative to the gate, it is also called a selfaligned process.
• Once the source and drain regions are
completed, the entire surface is again
covered with an insulating layer of silicon
dioxide (i). The insulating oxide layer is
then patterned in order to provide contact
windows for the drain and source junctions
(j).
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Making a CMOS Device - 3
• The surface is covered with evaporated aluminum (5000A) which will
form the interconnects (k). Finally, the metal layer is patterned and etched,
completing the interconnection of the MOS transistors on the surface (l).
Usually, a second (and third) layer of metallic interconnect (>5000A) can
also be added on top of this structure by creating another insulating oxide
layer, cutting contact (via) holes, depositing, and patterning the metal.
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CMOS n-Well Process
•
We have covered (1) the basic process
steps for pattern transfer through lithography,
and (2) gone through the fabrication procedure
of a single n-type MOS transistor. Now we
consider the fabrication sequence of n-well
CMOS integrated circuits. Shown are both the
top view of the lithographic masks and a crosssectional view of the relevant areas.
•
The n-well CMOS process starts with a
moderately doped (impurity concentration
~1016/cm3) p-type silicon substrate. Then, an
initial thick “field” oxide layer (5000A) is grown
on the entire surface. The first lithographic mask
defines the n-well region. Donor atoms, usually
phosphorus, are implanted through this window
in the oxide. Once the n-well is created, the
active areas of the nMOS and pMOS transistors
can be defined. The next figures show the
significant milestones that occur during the
fabrication process of a CMOS inverter.
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Following the creation of the n-well region,
a thick field oxide is grown around the transistor
active regions, and a thin gate oxide (25A) is
grown on top of the active regions.
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CMOS n-Well
• The polysilicon layer
(3000A) is deposited using
chemical vapor deposition
(CVD) and patterned by dry
plasma etching. The created
polysilicon lines will function as
the gate electrodes of the
nMOS and the pMOS
transistors and their
interconnects. Also, the
polysilicon gates act as selfaligned masks for the
source and drain implantations
that follow this step
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Polysilicon Gate Connections
CVD Chemical Reactions
• SiH4(gas) + O2(gas)  SiO2(solid) + 2H2 (gas)
• SiH4(gas) + H2(gas) +SiH2(gas)  2H2(gas) + PolySilicon (solid)
Continuous gas flow
Diffusion of
reactants
Boundary layer
Deposited film
Silicon substrate
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CMOS n-Well
•Using a set of two masks, the
n+ and p+ Source and Drain
regions are implanted into the
substrate and into the n- well,
respectively.
•The ohmic contacts to the
substrate and to the n-well are
implanted in this process step.
(If a doped silicon region is
partially doped to >1018/cm3,
then metal contacts to that
volume are almost always
ohmic (no Shottkey Barrier
effect). The possibility of a
Shottkey Barrier effect is
always possible, and care must
be made of the selection of
doping and metal contacts.)
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Isolation layer
(discussed later)
CMOS n-Well
• An insulating silicon dioxide
layer is deposited over the entire
wafer using CVD (5000A). This is
for passivation, the protection
of all the active components from
contamination.
• The contacts are defined and
etched away to expose the
silicon or polysilicon contact
windows. These contact windows
are necessary to complete the
circuit interconnections using the
metal layer, which is patterned in
the next step.
• (CVD = Chemical Vapor
Deposition, where reactive gases
collide above the wafer, and
chemical reaction products then
fall onto the wafer creating a new
layer.)
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CMOS n-Well
• Metal (aluminum, >5000A)
is deposited over the entire
chip surface using metal
evaporation, and the metal
lines are patterned through
etching. Since the wafer
surface is non-planar, the
quality and the integrity of the
metal lines created in this step
are very critical and are
ultimately essential for circuit
reliability.
• Since the metal connects
two separate devices, it is
called Local Interconnect.
The connection of adjacent
devices is often called LI-1, as
being the lowest level of
interconnection.
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Interconnection Materials
• Polysilicon interconnects are used to connect
Gates and other short-distance connections which
have minimal currents. Polysilicon is a very stable
material that rarely interacts with nearby materials.
• Metal interconnects have 3-5x the speed of
polysilicon (electron mobility is higher) and less
resistance. However, metals may react with nearby
materials, and may have to be encapsulated using
nitrides (e.g. Si3N4 or TiN) to prevent unwanted
reactions, or partial erosion in subsequent etching
procedures. This is expensive. In Upper Metallurgy
(not local interconnects) metal is always used
because processing is simple: only Metal + SiO2.
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CMOS n-Well
• The composite layout and
the resulting cross-sectional
view of the chip, showing one
nMOS and one pMOS
transistor (built-in n-well), the
polysilicon and metal
interconnections.
• The final step is to deposit
a full SiO2 passivation layer
(5000A), for protection, over the
chip, except for wire-bonding
pad areas.
• If the wafer will be stored
for some months, a final thin
blanket layer of Si3N4 may be
applied to prevent penetration
by water vapor. Completed
FEOL wafers are sometimes
stored for more than a year
before processing in a BEOL
factory.
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CMOS n-Well
The patterning process by the use of a succession of masks and process
steps is conceptually summarized below. It is seen that a series of
SEVEN masking steps and 34 process steps
must be sequentially performed for the desired patterns to be created on
the wafer surface. An example of the end result of this sequence is shown
as a cross-section on the right.
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Advanced CMOS Technologies
Twin-Tub (Twin-Well) CMOS Process
• This technology provides the basis for separate optimization of the
nMOS and pMOS transistors, thus making it possible for threshold voltage,
body effect and the channel transconductance of both types of transistors
to be tuned independently. Generally, the starting material is a n+ or p+
substrate, with a lightly doped epitaxial layer (~1015/cm3) on top.
This epitaxial layer provides the actual substrate on which the n-well and
the p-well are formed. Since two independent doping steps are performed
for the creation of the well regions, the dopant concentrations can be
carefully optimized to produce the desired device characteristics.
• In the conventional n-well CMOS process, the doping of the well
region is typically about one order of magnitude higher than the substrate,
which, among other effects, results in unbalanced drain parasitics
(possible latchup). The twin-tub process, below, avoids this problem.
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Advanced CMOS Technologies
Substrate for Twin-Well MOS Technogy
For inexpensive and low-performance chips, one may use a heavily doped substrate
and omit one well. The substrate should be doped to about 1016/cm3, with a resistivity
of about 1 Ω-cm. This allows simpler construction, with good “Ground Potential”
distribution, but the devices are not optimal and there is a chance of latch-up if the
voltages are pushed hard.
For high-performance chips, one uses a low doped substrate, 1015/cm3, 10 Ω-cm, and
then constructs Two Wells at optimum doping levels (called Tubs in the diagram).
Since the substrate is lightly doped, there is less chance for latch-up because of the high
resistivity.
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Advanced CMOS Technologies
Silicon-on-Insulator (SOI) CMOS Process
•Rather than using silicon as the substrate material, an insulating substrate
will improve process characteristics such as speed and latch-up
susceptibility. The SOI CMOS technology allows the creation of
independent, completely isolated nMOS and pMOS transistors virtually
side-by-side on an insulating substrate. The main advantages of this
technology are the higher integration density (because of the absence of
well regions), complete avoidance of the latch-up problem, and lower
parasitic capacitances compared to the conventional n-well or twin-tub
CMOS processes. A cross-section of nMOS and pMOS devices in created
using SOI process is shown below.
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References
• CMOS Digital Integrated Circuit Design - Analysis and
Design by S.M. Kang and Y. Leblebici
• W. Maly, Atlas of IC Technologies, Menlo Park, CA:
Benjamin/Cummings, 1987.
• A. S. Grove, Physics and Technology of Semiconductor
Devices, New York, NY: John Wiley & Sons, Inc., 1967.
• G. E. Anner, Planar Processing Primer, New York, NY:
Van Nostrand Rheinhold, 1990.
• T. E. Dillinger, VLSI Engineering, Englewood Cliffs, NJ:
Prentice-Hall, Inc., 1988.
• S.M. Sze, VLSI Technology, New York, NY: McGrawHill, 1983.
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New Concepts in this Lecture
• Single Well Construction – Only need to construct one “well” if
use p+ or n+ substrate. (2,3)
• Photoresist – 5 step process for application and patterning.
Can be used for Deposition, Etching or Deliniation (4-7)
• Self aligned Gate – Make Gate structure so it automatically
aligns source/drain. (10,11)
• Field Oxide – General protection to devices is given by
depositing thick SiO2 layer at beginning (13)
• Interconnects – Basic devices may be connected together
with either metal or polysilicon bands, depending on the
expected signal current. (19)
• Twin-Tub CMOS – Uses p or p- substrates to prevent latchup
and cross-talk, but requires separate tubs for the pMOS and
nMOS devices (22)
• CMOS on SOI – By putting CMOS circuits on SOI (silicon on
insulator) the substrate capacitance is eliminated (2x increase
in speed) and cross-talk/latchup is eliminated. (24)
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